> CVD Systems > PECVD (Plasma Enhanced CVD) Systems
Utilized in compound semiconductor and silicon
device fabrication, Plasma Enhanced Chemical Vapor Deposition (PECVD) systems are
designed for the deposition of insulation and passivation films.
PECVD systems can deposit high-quality silicon-based thin films (SiO2, Si3N4, SiOxNy, a-Si:H).