UV-300HC

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UV-Ozone Cleaning System
The UV-300HC is a completely dry UV Ozone Cleaning process equipped with cassette to cassette mechanism to strip photoresist and to remove all types of organic contaminant using both UV light radiation and high concentration ozone. This system includes two cassettes and can have a max. of 12 trays/cassette.

Dimensions:

Main Unit: 1100(W) x 1740(D) x 1625(H) mm

Utilizes a unique combination of ultraviolet light, high-concentration ozone and controlled heating for efficient cleaning
"Soft" completely dry process will not cause electrical damage to circuits
Easy, drawer type loading of substrates
Compact, uses minimum clean room space
Temperature control (Ambient to 300°C)
Operates at atmospheric pressure - no vacuum system required
Safety features include: drawer interlock, automatic purge cycle, air pressure interlock, cooling water interlock, ozone scrubber and emergency off switch

Stripping of photoresist and polyimide
Removing ink from EPROM wafers without erasing programs
Removing organic contamination from substrates prior to thin film deposition
Surface preparation for lube or photoresist
Descumming photoresist and E-beam resist
Cleaning prior to wafer bonding