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Etching Systems
ICP Etching Systems
(Inductively Coupled Plasma Etching)
DRIE Systems
(Deep Reactive Ion Etching)
RIE Systems
(Reactive Ion Etching)
CVD Systems
PECVD Systems
(Plasma Enhanced CVD)
LS-CVD Systems
(Liquid Source CVD)
Cleaning Systems
UV-Ozone Cleaners
Plasma Cleaners
(Direct Plasma)
Plasma Cleaners
(Remote Plasma)
LED
(Light Emitting Diodes)
LD
(Laser Diodes)
MEMS
(Microelectromechanical Systems)
TSV
(Through Silicon Vias)
Power Devices
SAW Devices
RF Devices
Photonic Crystals
Optoelectronics
Electronic Components
Silicon
Surface Treatment
Display Devices
Etching
Tornado ICP
®
Bosch Process
GaN Power Device Etching
GaN / AlGaN Etching
Deposition
LSCVD
Cleaning
Reversible Electrode Shelf
Remote Plasma Sources
Chemical vs Physical Cleaning
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2009
RIE-800iPB Deep RIE System at Princeton University
Mar 27, 2009
RIE-800iPB
, deep silicon etching system with Bosch Process is being used at
Princeton University's Micro/Nano Fabrication Laboratory
.
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samco-ucp ltd.
Industriering 10 LI-9491 Ruggell Liechtenstein
Phone: 423-377-5959
Email:
info@samco-ucp.com
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