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Etching Systems
ICP Etching Systems
(Inductively Coupled Plasma Etching)
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(Deep Reactive Ion Etching)
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(Liquid Source CVD)
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®
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2009
RIE-200iP ICP Etching System at Princeton University
Mar 27, 2009
SAMCO RIE-200iP,
Inductively Coupled Plasma (ICP) etching system is being used at
Princeton University's Micro/Nano Fabrication Laboratory.
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samco-ucp ltd.
Industriering 10 LI-9491 Ruggell Liechtenstein
Phone: 423-377-5959
Email:
info@samco-ucp.com
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