News & Events


SAMCO RIE-200iP in Scientific Paper

Mar 12, 2014

Inductively coupled plasma reactive ion etching of GaAs wafer pieces with enhanced device yield

 Michael K. Connors, Leo J. Missaggia, William S. Spencer, and George W. Turner
 Lincoln Laboratory, Massachusetts Institute of Technology, 244 Wood Street, Lexington, Massachusetts 02420

System used in the research: SAMCO ICP Reactive Ion Etch System, RIE-200iP

News & Events

Contact Us

samco-ucp ltd.
Industriering 10 LI-9491 Ruggell Liechtenstein
Phone: 423-377-5959


Upcoming Exhibitions

Back to Top