Etching Systems


ICP Etching System
RIE-400iP is a load-lock type etching system designed for the precise and highly uniform etching of various semiconductor and dielectric films, and can process up to φ4" wafers and smaller pieces. samco-ucp's proprietary "Tornado Coil" ICP electrode enables the generation of highly uniform, high density plasma. Users can choose between two ICP sources in order to optimize process results for various materials and applications.


Contact Us

  • Features
  • Applications
  • Vertical sidewalls with excellent uniformity InP Etching

  • Single wafer processing for up to ø4" round wafers

  • Tornado ICP allows easy plasma discharge at low powers and pressures

  • Original Vacuum system allows for precise vacuum control and stability

  • Lower Damage highly chemical etching from low ICP powers

  • Active temperature control of sample stage and inner wall of the reaction chamber

  • Interferometric endpoint detection system (optional)

  • Fabrication of laser diodes

  • Etching of GaN, GaAs, and InP

  • LD ridge formation

  • Photonic crystal devices

  • Quantum dot devices

Contact Us

samco-ucp ltd.
Industriering 10 LI-9491 Ruggell Liechtenstein
Phone: 423-377-5959


Back to Top