Remote Plasma Sources

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samco-ucp Plasma Cleaning Systems are particularly equipped with remote plasma sources for outstanding cleaning results. In addition, the patented hydrogen process (US 6203637) is well-suited for removing various kinds of surface contaminants.


Chemical cleaning with DC plasma
The batch-type Plasma Cleaning Systems of the LFC150 family operate with a low pressure DC plasma generated by a hot filament. The patented plasma chemical cleaning process takes advantage of low-energy ions and radicals that react with surface contaminants to form volatile compounds.


Chemical cleaning with RF downstream plasma
The single substrate Plasma Cleaning System as well uses the principle of damage-free plasma chemical cleaning. The excitation of the process gas is accomplished by an RF powered hollow cathode plasma source. Remote plasma processing ensures that sensitive substrates are effectively shielded from the primary RF plasma.

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samco-ucp ltd.
Industriering 10 LI-9491 Ruggell Liechtenstein
Phone: 423-377-5959


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