CVD Systems

LS-CVD (Liquid Source CVD) Systems

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samco-ucp's LS-CVD (Liquid Source CVD) systems achieve superior step-coverage and gap-fill performance, required for the MEMS, 3D-LSI, and Opto Electronics markets. Importantly, the technology enables deposition at lower temperatures and doesn't require toxic or flammable gases. LS-CVD systems can deposit high-quality TEOS-SiO2, LS-SiN, High-k think film, and Diamond-like-carbon (DLC).

PD-270STP

PD-270STP

  • Liquid source CVD system
  • Low-temperature thick oxide deposition
  • Process up to 8" wafers
  • High deposition rates

Details

PD-270STL

PD-270STL

  • Liquid source CVD system
  • Low-temperature thick oxide deposition
  • Process up to 8" wafers
  • Load lock version of the PD-270STP

Details

Contact Us

samco-ucp ltd.
Industriering 10 LI-9491 Ruggell Liechtenstein
Phone: 423-377-5959
Email: info@samco-ucp.com

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