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Etching Systems
ICP Etching Systems
(Inductively Coupled Plasma Etching)
DRIE Systems
(Deep Reactive Ion Etching)
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(Reactive Ion Etching)
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(Plasma Enhanced CVD)
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(Liquid Source CVD)
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UV-Ozone Cleaners
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(Direct Plasma)
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(Through Silicon Vias)
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Tornado ICP
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2002
RIE-200iP, ICP Etching Systems at University of Delaware
Oct 8, 2002
SAMCO RIE-200iP (Chlorine-based Inductively Coupled Plasma) and SAMCO RIE-200iP (Fluorine-based Inductively Coupled Plasma) etching systems
are being used at the University of Delaware's Electrical & Computer Engineering Department
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samco-ucp ltd.
Industriering 10 LI-9491 Ruggell Liechtenstein
Phone: 423-377-5959
Email:
info@samco-ucp.com
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