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Testimonial from Dr. Dennis Prather, University of Delaware

Oct 5, 2004

Initially the etching aspect of our fabrication process at the University of Delaware revolved around a conventional RIE system. However, due to the inherent limitations of this machine we looked to upgrade to an ICP. While our initial survey of available machines included most of the well know vendors within the US and the UK, we also became aware of SAMCO. As I was initially concerned that SAMCO did not have a large market share in the US, these concerns were quickly relieved with my interaction with the SAMCO staff. In particular, their staff offered extreme expertise in the configuration of not only the ICP but also the infrastructure necessary for its installation.


In this regard, they also demonstrated an exemplary knowledge of many applications related to both Cl and F based etching, which proved critical helping us get up to speed in terms of developing optimal etch processes for our applications. During the construction and out fitting of our new nano-fabrication facility, in DuPont Hall, our interaction with SAMCO has far exceeded the level of interaction and support that we have received from any other instrument in the entire facility. For all of our future equipment purchases, my first choice will be SAMCO!

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