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Etching Systems
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(Inductively Coupled Plasma Etching)
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(Deep Reactive Ion Etching)
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(Reactive Ion Etching)
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(Plasma Enhanced CVD)
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(Liquid Source CVD)
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UV-Ozone Cleaners
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(Through Silicon Vias)
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®
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2004
PD-220N, PECVD System in University of Delaware
Nov 22, 2004
PD-220N
, Plasma Enhanced Chemical Vapor Deposition (PECVD) System, is being used at
University of Delaware's Electrical & Computer Engineering Department
.
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samco-ucp ltd.
Industriering 10 LI-9491 Ruggell Liechtenstein
Phone: 423-377-5959
Email:
info@samco-ucp.com
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